Extreme Ultra-Violet (EUV) breaks the 10 nanometer barrier
Extreme Ultra-Violet (EUV) breaks the 10 nanometer barrier - Domestic enterprises and academia level up in the field of semiconductor EUV lithography – The birth of innovative artificial intelligence such as AlphaGo has been made possible by semiconductor manufacturing technologies for faster and highly integrated semiconductors with high-performance and low-power consumption. One such key technology, which draws fine circuit patterns by using light in order to manufacture su